Own publications or when working as a co-author:

[2] R. Wiese, H. Kersten, G. Wiese, R. Bartsch, Energy influx measurements with an active thermal probe in plasma-technological processes

EPJ Techniques and Instrumentation, Volume 2, Issue 1, 2015

[3] R. Wiese, G. Wiese, R. Bartsch, H. Kersten, S. Kähler, Eine aktive Thermosonde zur richtungsabhängigen Messung des Energieeinstromes bei plasmatechnologischen Prozessen

19th NDVaK, Dresden 2011, lecture

[4] R. Wiese, Neue Methoden der Diagnostik von Plasmaquellen

Dissertation (2008) University of Greifswald

[5] V. Sittinger, F. Ruske, B. Szyszka, R. Wiese, H. Kersten, Plasma chracterization tools and application to reactive sputtering of Al-doped ZnO thin films

Glass Coatings (2006) 2, 48-53

R. Wiese, H. Kersten, Verfahren und aktive Thermosonde zur kontinuierlichen Messung der Strahlungsimmission, German Patent and Trademark Office, AZ 10 2007033 947.1, July 19, 2007

R. Wiese, R. Bartsch, Aktive Thermosonde und Verfahren zur kontinuierlichen Messung des Energieeintrages und Verfahren zur Regelung der Temperatur an der Messstelle

European Patent Office Den Hag, PCT/EP2011/053371, 07.03.2011

C. Bundesmann, C. Eichhorn, F. Scholze, D. Spemann, H. Neumann, D. Pagano, S. Scaranzin, F. Scortecci, HJ Leiter, S. Gauter, R. Wiese, H. Kersten, K. Holste , P. Köhler, PJ Klar, S. Mazouffre, R. Blott, A. Bulit, K. Dannenmayer, An advanced electric propulsion diagnostic (AEPD) platform for in-situ characterization of electric propulsion thrusters and ion beam sources

Eur. Phys. J. D (2016) 70: 212

F. Ruske, V. Sittinger, W. Werner, B. Szyszka, R. Wiese, Flux of Positive Ions and Film Growth in Reactive Sputtering of Al-Doped ZnO Thin Films

Plasma Processes and Polymers, 4/2007, S. 336-340

H. Kersten, R. Wiese, H. Neumann, R. Hippler, “Interaction of ion beams with dusty plasmas”,

Plasma Phys. Contr. Fusion 48(2006), B105-B113.

F Ruske, V Sittinger, W Werner, B Szuszka, R Wiese, M Hannemann, H Kersten, "Role of positive ions in reactive sputtering of Al-doped ZnO thin films",

DPG Spring Conference "Thin Layers" 2006, Dresden, March 2006, DS19.4., Lecture

R. Wiese, H. Kersten, L. Kotte, S. Krause, I. Dani, V. Hopfe, “Measurement of the energy flux to the substrate during atmospheric pressure microwave plasma processing”,

PSE-10, Garmisch-Partenkirchen, September 2006, Poster

E. Stoffels, R. E. J. Sladek,  I.E. Kieft, H. Kersten, R. Wiese, Power outflux from the plasma: an important parameter in
surface processing
Plasma Phys. Control. Fusion, 46 (2004), B167

R. Wiese, H. Kersten, M. Hannemann, V. Sittinger, F. Ruske, R. Menner, Determination of Plasma Parameters during Deposition of ZnO Films by Ceramic and Metallic Targets and Correlation with Film Properties

Plasma Process. Polym. 2007, 4, S527–S530

H. Kersten, R. Wiese, M. Hannemann, A. Kapitov, F. Scholze, H. Neumann, R. Hippler, Plasma and ion beam chrakterization by non-conventional methods

Surfcoat. 2005.02.173, 809-813

R. Wiese, H. Kersten, Einsatz einer aktiven Thermosonde zur Diagnostik von Prozessplasmen

Galvanotechnik 6 (2008) 1502-1507

External publications on the subject of measuring the energy Influx:

R. Gardon, An Instrument for the direct measurement of intens thermal radiation

Rev. Sci. Instrum. 24, (1953) 366

H Kersten, D Rohde, H Steffen, H Deutsch, R Hippler, "Die Bestimmung von Energieflüssen bei Plasma-Oberflächen-Prozessen"

Technical journal Galvanotechnik, 12 (2005), 2996-3007

M. Tatanova, G. Thieme, R. Basner, M. Hannemann, Y.B. Golubovskii, H. Kersten, „About the EDF formation in a capacitively coupled argon plasma”

Plasma Sources Sci. Technol. 15(2006)8, 507.

H. Steffen, H. Kersten, H. Wulff, Investigation of the energy transfer to the substrate during titanium deposition in a hollow cathode arc

J. Vac. Sci. Technol. A 12, (1994) 2780

K. Ellmer, R. Mientus, Calorimetric measurements with a heat flux transducer of the total power influx onto a substrate during magnetron sputtering

Surf. Coat. Techn. 116‑119, (1999) 1102-1106

H. Kersten, D. Rohde, J. Berndt, H. Deutsch, R. Hippler, Investigations on the energy influx at plasma processes by means of a simple thermal probe

Thin Solid Films 377‑378, (2000) p. 585-591.

H. Kersten, H. Deutsch, H. Steffen, G.M.W. Kroesen, R. Hippler, The energy balance at substrate surfaces during plasma processing

Vacuum 63, (2001) 385-431

H. Kersten, E. Stoffels, W.W. Stoffels, M. Otte, C. Csambal, H. Deutsch, R. Hippler, Energy influx from rf plasma to a substrate during plasma process

J. Appl. Phys. 87, (2000) 3637

A notice:

The list of publications is not complete. It is constantly updated.